Business registries · firm from USPTO records

Applied Materials, Inc.

USPTO only Derived from USPTO records only (patent assignees and trademark owners); FURP found no state registration, Form D, Form ADV, nonprofit, SEC or lobbying record with this name and place.

Place
3050 Bowers Avenue, Santa Clara, CA
Entity type
Corporation
State of organization
DE (as the owner states it in trademark filings)
Patents
8,890 granted 1981-06-09 to 2025-12-30
Trademarks
534, 343 live
Record
EXACT high confidence: USPTO records only: patent assignee and trademark owner with the same name (legal endings aside) and place
Source
USPTO: PVGPATDIS and TRCFECO2 (PVGPATDIS file of 2026-04-10, TRCFECO2 file of 2024-03-27); patent assignee and trademark owner with the same name (legal endings aside) and place

Patents

PatentTitleGrantedSource
US D1154856Target profile for a physical vapor deposition chamber target2026-10-20PTBLXML, file of 2026-10-20
US 12772814Method of forming a metal liner for interconnect structures2026-10-20PTBLXML, file of 2026-10-20
US 12772799Stress management for precise substrate-to-substrate bonding2026-10-20PTBLXML, file of 2026-10-20
US 12772795Vibration dampener using array of vertical O-rings2026-10-20PTBLXML, file of 2026-10-20
US 12772779Photo-emitting plasma for activation in processing chambers, and related apparatus and methods2026-10-20PTBLXML, file of 2026-10-20
US 12772776Drying system with integrated substrate alignment stage2026-10-20PTBLXML, file of 2026-10-20
US 12772772Mitigation of first wafer effect2026-10-20PTBLXML, file of 2026-10-20
US 12772766Substrate stress management using direct selective area processing2026-10-20PTBLXML, file of 2026-10-20
US 12772764Methods of forming conformal silicon oxycarbonitride thin films on high aspect ratio semiconductor structures2026-10-20PTBLXML, file of 2026-10-20
US 12772761Growth monitor system and methods for film deposition2026-10-20PTBLXML, file of 2026-10-20
US 12772755Contact layer formation with microwave annealing for NMOS devices2026-10-20PTBLXML, file of 2026-10-20
US 12772440Method and structure of low-k spacer using post-treatment for memory applications2026-10-20PTBLXML, file of 2026-10-20
US 12772433Single gate three-dimensional (3D) dynamic random-access memory (DRAM) devices2026-10-20PTBLXML, file of 2026-10-20
US 12770840Electrostatic chuck assembly2026-10-20PTBLXML, file of 2026-10-20
US 12770838Liner and edge ring to prevent gas diffusion2026-10-20PTBLXML, file of 2026-10-20
US 12770833Plasma chamber with a multiphase rotating gas cross-flow and peripheral conductance control rings2026-10-20PTBLXML, file of 2026-10-20
US 12770828Multi-electrode source assembly for plasma processing2026-10-20PTBLXML, file of 2026-10-20
US 12769048Optical devices having barrier layers to facilitate reduced hardmask diffusion and/or hardmask residue, and related methods2026-10-20PTBLXML, file of 2026-10-20
US 12768798Polarized imaging reflectometer2026-10-20PTBLXML, file of 2026-10-20
US 12768690Variably choked pressure rate-of-rise mass flow verifier2026-10-20PTBLXML, file of 2026-10-20
US 12768596Reflector for process chamber2026-10-20PTBLXML, file of 2026-10-20
US 12768074Chamber architecture for epitaxial deposition and advanced epitaxial film applications2026-10-20PTBLXML, file of 2026-10-20
US 12768044Precursor delivery system2026-10-20PTBLXML, file of 2026-10-20
US 12768043Hardware to uniformly distribute active species for semiconductor film processing2026-10-20PTBLXML, file of 2026-10-20
US 12768041Methods for forming impurity free metal alloy films2026-10-20PTBLXML, file of 2026-10-20

The newest 25 of 8,890. All patents of this assignee

Trademarks

MarkSerialFiledStatusClassesSource
APERIO501685622026-10-19Pending application009TRTDXFAP, file of 2026-10-20
EPIC501535962026-10-09Pending application035, 042TRTDXFAP, file of 2026-10-10
EPIC CENTER501535922026-10-09Pending application035, 042TRTDXFAP, file of 2026-10-10
DEFI501494352026-10-07Pending application009TRTDXFAP, file of 2026-10-09
MATR501494332026-10-07Pending application009TRTDXFAP, file of 2026-10-09
DSF501141932026-09-17Pending application007TRTDXFAP, file of 2026-09-18
LIGHTVEIL500784772026-08-28Pending application009TRTDXFAP, file of 2026-10-20
APPLIED XVISION998764562026-06-10Pending application007, 009, 037TRTDXFAP, file of 2026-10-23
PLATERA998200282026-05-13Pending application007, 009TRTDXFAP, file of 2026-10-14
XVISION997810702026-04-22Pending application007, 009, 037TRTDXFAP, file of 2026-09-16
TOPIX997763952026-04-21Pending application042TRTDXFAP, file of 2026-09-30
NIMBUS997752662026-04-20Pending application007, 009TRTDXFAP, file of 2026-08-19
TLM997625102026-04-14Pending application037TRTDXFAP, file of 2026-09-16
DIRECTRA997599572026-04-13Pending application007, 009TRTDXFAP, file of 2026-09-16
SPECTRAL996419482026-02-09Pending application007, 009TRTDXFAP, file of 2026-10-22
SPECTRA996269702026-01-31Pending application007, 009TRTDXFAP, file of 2026-07-23
VELORA996168062026-01-27Pending application007, 009TRTDXFAP, file of 2026-08-19
VALENTIS995588162025-12-19Pending application007, 009TRTDXFAP, file of 2026-07-15
ZERRA994572372025-10-22Pending application007, 009TRTDXFAP, file of 2026-10-14
IQWORKS993469092025-08-20Abandoned042TRTYRAP, file of 2026-04-03
LANCER992868022025-07-16Pending application007, 009TRTDXFAP, file of 2026-05-09
SMARTFACTORY AI992626352025-07-01Pending application042TRTDXFAP, file of 2026-10-14
SMARTFACTORY AI IQWORKS992417362025-06-18Pending application042TRTDXFAP, file of 2026-10-01
XTERA991859092025-05-14Registered007TRTDXFAP, file of 2026-09-30
FULLSCAN991619042025-04-29Pending application007TRTDXFAP, file of 2026-08-15

The newest 25 of 534. All marks of this owner

Sharing an address can mean a parent and subsidiary, a shared office or a registered agent; it isn’t proof of a connection.

Firms here are built from USPTO patent assignees (PatentsView) and trademark owners: one firm per name (legal endings aside) and state, or country outside the US. Matches to other records are by name and state: EXACT means the identical full name, FUZZY a looser match, with the confidence shown.