Patents
US 12770838 B2: Liner and edge ring to prevent gas diffusion
- Granted
- 2026-10-20
- Filed
- 2024-02-01 application 18429618
- Type
- Utility · 20 claims
- Elsewhere
- Google Patents ↗ · USPTO patent document ↗ · USPTO Patent Center record ↗
Abstract
Process kits for semiconductor manufacturing processing chambers and semiconductor manufacturing processing chambers using the process kits are described. The process kits include an edge ring with a lower annular ring portion having a plurality of annularly spaced edge ring fins extending upwardly from the top surface of the lower annular ring portion. A liner has an inwardly directed annular extension with annularly spaced liner fins extending downwardly from the bottom surface of the inwardly directed annular extension. The edge ring fins and liner fins interdigitate without contacting to form a tortuous flow path.
Source: PTBLXML, file of 2026-10-20 (ipgb20261020.xml).
Assignees
| Assignee | Type | Place | Also on furp.org | Source |
|---|---|---|---|---|
| Applied Materials, Inc. 9,683 patents | US company or organization | Santa Clara, CA | PTBLXML, file of 2026-10-20 |
Inventors
| Inventor | Place | Patents | Person page | Source |
|---|---|---|---|---|
| Shashidhara Patel H B | Bangalore, IN | 6 | PTBLXML, file of 2026-10-20 | |
| Amit Sahu | Bangalore, IN | 3 | PTBLXML, file of 2026-10-20 | |
| Muhannad Mustafa | Milpitas, CA | 44 | PTBLXML, file of 2026-10-20 | |
| Sanjeev Baluja | Campbell, CA | 117 | PTBLXML, file of 2026-10-20 | |
| Yixiong Yang | Fremont, CA | 70 | PTBLXML, file of 2026-10-20 | |
| Srinivas Gandikota | Santa Clara, CA | 158 | PTBLXML, file of 2026-10-20 |
CPC categories
| Subclass | Category | First group | Source |
|---|---|---|---|
| H01J | Electric discharge tubes or discharge lamps | H01J37/32642 | PTBLXML, file of 2026-10-20 |
| C23C | Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general | C23C16/45544 | PTBLXML, file of 2026-10-20 |
| H10P | Generic processes or apparatus for the manufacture or treatment of devices covered by class h10 | H10P72/7606 | PTBLXML, file of 2026-10-20 |
Cooperative Patent Classification, as currently assigned (one row per subclass).
Assignments and security interests
No recorded assignments or security interests on file for this patent.
USPTO bulk data: PatentsView granted patents, disambiguated (PVGPATDIS) for patents, assignees, inventors, places and CPC categories; the USPTO Patent Assignment Dataset (ECORSEXC) for assignments and security interests. Patents filed in the last 20 years. No claims or full text. Links to other records are by name (and state): EXACT means the identical full name and state; FUZZY means a looser name match, with the confidence shown.