Patents
US 12772772 B2: Mitigation of first wafer effect
- Granted
- 2026-10-20
- Filed
- 2024-05-10 application 18660774
- Type
- Utility · 17 claims
- Elsewhere
- Google Patents ↗ · USPTO patent document ↗ · USPTO Patent Center record ↗
Abstract
Embodiments of the disclosure relate to methods for reducing or eliminating the first wafer effect after chamber cleans for plasma etch processes. In some embodiments, the wafer support is maintained at an elevated temperature relative to the etch process. In some embodiments, the etch process is a NF3+NH3 plasma etch to remove native oxides from a silicon substrate.
Source: PTBLXML, file of 2026-10-20 (ipgb20261020.xml).
Assignees
| Assignee | Type | Place | Also on furp.org | Source |
|---|---|---|---|---|
| Applied Materials, Inc. 9,683 patents | US company or organization | Santa Clara, CA | PTBLXML, file of 2026-10-20 |
Inventors
| Inventor | Place | Patents | Person page | Source |
|---|---|---|---|---|
| Yongqian Gao | Sunnyvale, CA | 5 | PTBLXML, file of 2026-10-20 | |
| Michael S. Jackson | Sunnyvale, CA | 18 | PTBLXML, file of 2026-10-20 | |
| David T. Or | Santa Clara, CA | 19 | PTBLXML, file of 2026-10-20 | |
| Chun-Chieh Wang | Sunnyvale, CA | PTBLXML, file of 2026-10-20 | ||
| Le Zhang | Fremont, CA | PTBLXML, file of 2026-10-20 |
CPC categories
| Subclass | Category | First group | Source |
|---|---|---|---|
| H10P | Generic processes or apparatus for the manufacture or treatment of devices covered by class h10 | H10P70/20 | PTBLXML, file of 2026-10-20 |
| H01J | Electric discharge tubes or discharge lamps | H01J37/321 | PTBLXML, file of 2026-10-20 |
Cooperative Patent Classification, as currently assigned (one row per subclass).
Assignments and security interests
No recorded assignments or security interests on file for this patent.
USPTO bulk data: PatentsView granted patents, disambiguated (PVGPATDIS) for patents, assignees, inventors, places and CPC categories; the USPTO Patent Assignment Dataset (ECORSEXC) for assignments and security interests. Patents filed in the last 20 years. No claims or full text. Links to other records are by name (and state): EXACT means the identical full name and state; FUZZY means a looser name match, with the confidence shown.