Patents

US 12768074 B2: Chamber architecture for epitaxial deposition and advanced epitaxial film applications

Granted
2026-10-20
Filed
2024-03-12 application 18602099
Type
Utility · 20 claims
Elsewhere
Google Patents ↗ · USPTO patent document ↗ · USPTO Patent Center record ↗

Abstract

The present disclosure generally relates to a process chamber for processing of semiconductor substrates. The process chamber includes an upper lamp assembly, a lower lamp assembly, a susceptor, an upper window disposed between the substrate support and the upper lamp assembly, a lower window disposed between the lower lamp assembly and the substrate support, an inject ring, and a base ring. The susceptor includes a movement assembly. The movement assembly includes a bearing feedthrough assembly. The bearing feedthrough assembly is a ferrofluidic feedthrough assembly and functions as a ferrofluidic bearing. The bearing feedthrough assembly includes a shaft coupled to the support shaft. The shaft is rotated within the bearing feedthrough assembly. The bearing feedthrough assembly is combined with a first linear spline and a second linear spline.

Source: PTBLXML, file of 2026-10-20 (ipgb20261020.xml).

Assignees

AssigneeTypePlaceAlso on furp.orgSource
Applied Materials, Inc. 9,683 patentsUS company or organizationSanta Clara, CAPTBLXML, file of 2026-10-20

Inventors

InventorPlacePatentsPerson pageSource
Tetsuya IshikawaSan Jose, CA157PTBLXML, file of 2026-10-20
Swaminathan T. SrinivasanPleasanton, CAPTBLXML, file of 2026-10-20
Kartik Bhupendra ShahSaratoga, CAPTBLXML, file of 2026-10-20
Ala MoradianSunnyvale, CA64PTBLXML, file of 2026-10-20
Manjunath SubbannaBangalore, IN12PTBLXML, file of 2026-10-20
Matthias BauerSunnyvale, CA51PTBLXML, file of 2026-10-20
Peter ReimerLos Altos, CA51PTBLXML, file of 2026-10-20
Michael R. RicePleasanton, CA142PTBLXML, file of 2026-10-20

CPC categories

SubclassCategoryFirst groupSource
C30BSingle-crystal growth ; unidirectional solidification of eutectic material or unidirectional demixing of eutectoid material; refining by zone-melting of material ; production of a homogeneous polycrystalline material with defined structure ; single crystals or homogeneous polycrystalline material with defined structure; after-treatment of single crystals or a homogeneous polycrystalline material with defined structure ; apparatus thereforC30B25/14PTBLXML, file of 2026-10-20
C23CCoating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in generalC23C16/4412PTBLXML, file of 2026-10-20
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h10H10P72/0436PTBLXML, file of 2026-10-20

Cooperative Patent Classification, as currently assigned (one row per subclass).

Assignments and security interests

No recorded assignments or security interests on file for this patent.

USPTO bulk data: PatentsView granted patents, disambiguated (PVGPATDIS) for patents, assignees, inventors, places and CPC categories; the USPTO Patent Assignment Dataset (ECORSEXC) for assignments and security interests. Patents filed in the last 20 years. No claims or full text. Links to other records are by name (and state): EXACT means the identical full name and state; FUZZY means a looser name match, with the confidence shown.