Patents
US 12768041 B2: Methods for forming impurity free metal alloy films
- Granted
- 2026-10-20
- Filed
- 2024-04-22 application 18642134
- Type
- Utility · 17 claims
- Elsewhere
- Google Patents ↗ · USPTO patent document ↗ · USPTO Patent Center record ↗
Abstract
Methods of depositing a metal film by exposing a substrate surface to a halide precursor and an organosilane reactant are described. The halide precursor comprises a compound of general formula (I): MQzRm, wherein M is a metal, Q is a halogen selected from Cl, Br, F or I, z is from 1 to 6, R is selected from alkyl, CO, and cyclopentadienyl, and m is from 0 to 6. The aluminum reactant comprises a compound of general formula (II) or general formula (III): wherein R1, R2, R3, R4, R5, R6, R7, R8, Ra, Rb, Rc, Rd, Re, and Rf are independently selected from hydrogen (H), substituted alkyl or unsubstituted alkyl; and X, Y, X′, and Y′ are independently selected from nitrogen (N) and carbon (C).
Source: PTBLXML, file of 2026-10-20 (ipgb20261020.xml).
Assignees
| Assignee | Type | Place | Also on furp.org | Source |
|---|---|---|---|---|
| Applied Materials, Inc. 9,683 patents | US company or organization | Santa Clara, CA | PTBLXML, file of 2026-10-20 |
Inventors
| Inventor | Place | Patents | Person page | Source |
|---|---|---|---|---|
| Geetika Bajaj | Cupertino, CA | 26 | PTBLXML, file of 2026-10-20 | |
| Darshan Thakare | Palghar, IN | 10 | PTBLXML, file of 2026-10-20 | |
| Prerna Goradia | Mumbai, IN | 45 | PTBLXML, file of 2026-10-20 | |
| Robert Jan Visser | Menlo Park, CA | PTBLXML, file of 2026-10-20 | ||
| Yixiong Yang | Fremont, CA | 70 | PTBLXML, file of 2026-10-20 | |
| Jacqueline S. Wrench | San Jose, CA | 32 | PTBLXML, file of 2026-10-20 | |
| Srinivas Gandikota | Santa Clara, CA | 158 | PTBLXML, file of 2026-10-20 |
CPC categories
| Subclass | Category | First group | Source |
|---|---|---|---|
| C23C | Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general | C23C16/45553 | PTBLXML, file of 2026-10-20 |
| C08G | Macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds | C08G77/26 | PTBLXML, file of 2026-10-20 |
| H10D | Inorganic electric semiconductor devices | H10D64/01318 | PTBLXML, file of 2026-10-20 |
Cooperative Patent Classification, as currently assigned (one row per subclass).
Assignments and security interests
No recorded assignments or security interests on file for this patent.
USPTO bulk data: PatentsView granted patents, disambiguated (PVGPATDIS) for patents, assignees, inventors, places and CPC categories; the USPTO Patent Assignment Dataset (ECORSEXC) for assignments and security interests. Patents filed in the last 20 years. No claims or full text. Links to other records are by name (and state): EXACT means the identical full name and state; FUZZY means a looser name match, with the confidence shown.