Patents
US 12768043 B2: Hardware to uniformly distribute active species for semiconductor film processing
- Granted
- 2026-10-20
- Filed
- 2022-05-17 application 17663695
- Type
- Utility · 17 claims
- Elsewhere
- Google Patents ↗ · USPTO patent document ↗ · USPTO Patent Center record ↗
Abstract
A substrate processing system is provided having a processing chamber. The processing chamber includes a lid plate, one or more chamber sidewalls, and a chamber base that collectively define a processing volume. An annular plate is coupled to the lid plate, and an edge manifold is fluidly coupled to the processing chamber through the annular plate and the lid plate. The substrate processing system includes a center manifold that is coupled to the lid plate.
Source: PTBLXML, file of 2026-10-20 (ipgb20261020.xml).
Assignees
| Assignee | Type | Place | Also on furp.org | Source |
|---|---|---|---|---|
| Applied Materials, Inc. 9,683 patents | US company or organization | Santa Clara, CA | PTBLXML, file of 2026-10-20 |
Inventors
| Inventor | Place | Patents | Person page | Source |
|---|---|---|---|---|
| Harpreet Singh | Tracy, CA | 76 | PTBLXML, file of 2026-10-20 | |
| Jallepally Ravi | San Ramon, CA | 35 | PTBLXML, file of 2026-10-20 | |
| Zubin Huang | Santa Clara, CA | 34 | PTBLXML, file of 2026-10-20 | |
| Manjunatha Koppa | Bangalore, IN | 25 | PTBLXML, file of 2026-10-20 | |
| Sandesh Yadamane | Bangalore, IN | 9 | PTBLXML, file of 2026-10-20 | |
| Srinivas Tokur Mohana | Bangalore, IN | PTBLXML, file of 2026-10-20 | ||
| Shreyas Patil Shanthaveeraswamy | Bangalore, IN | PTBLXML, file of 2026-10-20 | ||
| Kai Wu | Palo Alto, CA | PTBLXML, file of 2026-10-20 | ||
| Peiqi Wang | Campbell, CA | 10 | PTBLXML, file of 2026-10-20 | |
| Mingrui Zhao | Newark, CA | PTBLXML, file of 2026-10-20 |
CPC categories
| Subclass | Category | First group | Source |
|---|---|---|---|
| C23C | Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general | C23C16/45561 | PTBLXML, file of 2026-10-20 |
| H10P | Generic processes or apparatus for the manufacture or treatment of devices covered by class h10 | H10P14/418 | PTBLXML, file of 2026-10-20 |
Cooperative Patent Classification, as currently assigned (one row per subclass).
Assignments and security interests
No recorded assignments or security interests on file for this patent.
USPTO bulk data: PatentsView granted patents, disambiguated (PVGPATDIS) for patents, assignees, inventors, places and CPC categories; the USPTO Patent Assignment Dataset (ECORSEXC) for assignments and security interests. Patents filed in the last 20 years. No claims or full text. Links to other records are by name (and state): EXACT means the identical full name and state; FUZZY means a looser name match, with the confidence shown.