Business registries · firm from USPTO records
Applied Materials, Inc.
USPTO only Derived from USPTO records only (patent assignees and trademark owners); FURP found no state registration, Form D, Form ADV, nonprofit, SEC or lobbying record with this name and place.
- Place
- Tusayan, AZ
- Entity type
- Not reported
- State of organization
- Not reported
- Patents
- 1 granted 2013-04-09 to 2013-04-09
- Trademarks
- 0
- Record
- EXACT high confidence: USPTO records only: one name
- Source
- USPTO: PVGPATDIS (PVGPATDIS file of 2026-04-10, TRCFECO2 file of 2024-03-27); one name
Patents
| Patent | Title | Granted | Source |
|---|---|---|---|
| US D1154856 | Target profile for a physical vapor deposition chamber target | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772814 | Method of forming a metal liner for interconnect structures | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772799 | Stress management for precise substrate-to-substrate bonding | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772795 | Vibration dampener using array of vertical O-rings | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772779 | Photo-emitting plasma for activation in processing chambers, and related apparatus and methods | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772776 | Drying system with integrated substrate alignment stage | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772772 | Mitigation of first wafer effect | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772766 | Substrate stress management using direct selective area processing | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772764 | Methods of forming conformal silicon oxycarbonitride thin films on high aspect ratio semiconductor structures | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772761 | Growth monitor system and methods for film deposition | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772755 | Contact layer formation with microwave annealing for NMOS devices | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772440 | Method and structure of low-k spacer using post-treatment for memory applications | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12772433 | Single gate three-dimensional (3D) dynamic random-access memory (DRAM) devices | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12770840 | Electrostatic chuck assembly | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12770838 | Liner and edge ring to prevent gas diffusion | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12770833 | Plasma chamber with a multiphase rotating gas cross-flow and peripheral conductance control rings | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12770828 | Multi-electrode source assembly for plasma processing | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12769048 | Optical devices having barrier layers to facilitate reduced hardmask diffusion and/or hardmask residue, and related methods | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12768798 | Polarized imaging reflectometer | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12768690 | Variably choked pressure rate-of-rise mass flow verifier | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12768596 | Reflector for process chamber | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12768074 | Chamber architecture for epitaxial deposition and advanced epitaxial film applications | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12768044 | Precursor delivery system | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12768043 | Hardware to uniformly distribute active species for semiconductor film processing | 2026-10-20 | PTBLXML, file of 2026-10-20 |
| US 12768041 | Methods for forming impurity free metal alloy films | 2026-10-20 | PTBLXML, file of 2026-10-20 |
Trademarks
No US trademarks on file under this name.
Possible related entities
No other firm on file at the same street address (no street address in these USPTO records).
Firms here are built from USPTO patent assignees (PatentsView) and trademark owners: one firm per name (legal endings aside) and state, or country outside the US. Matches to other records are by name and state: EXACT means the identical full name, FUZZY a looser match, with the confidence shown.