Patents
US 12768647 B2: Flatness error resistant photomask measurement techniques
- Granted
- 2026-10-20
- Filed
- 2024-11-13 application 18945782
- Type
- Utility · 20 claims
- Elsewhere
- Google Patents ↗ · USPTO patent document ↗ · USPTO Patent Center record ↗
Abstract
A method of determining a flatness of a substrate, the method including measuring a first flatness measurement of the substrate at a first orientation relative to a vertical direction, measuring a second flatness measurement of the substrate at a second orientation relative to the vertical direction, measuring a third flatness measurement of the substrate at a third orientation relative to a vertical direction, and measuring a fourth flatness measurement of the substrate at a fourth orientation relative to a vertical direction, each of the first orientation, the second orientation, the third orientation, and the fourth orientation being at a different orientation relative to the vertical direction. The method further including generating a first set of differences, fitting the first set of differences to respective orthogonal polynomials, and generating a true flatness of the substrate.
Source: PTBLXML, file of 2026-10-20 (ipgb20261020.xml).
Assignees
| Assignee | Type | Place | Also on furp.org | Source |
|---|---|---|---|---|
| CORNING INCORPORATED 4,960 patents | US company or organization | Corning, NY | CORNING INCORPORATED Federal lobbying client EXACT high confidence: identical full name and state | PTBLXML, file of 2026-10-20 |
Inventors
| Inventor | Place | Patents | Person page | Source |
|---|---|---|---|---|
| Thomas James Dunn | Penfield, NY | PTBLXML, file of 2026-10-20 | ||
| Steven James Van Kerkhove | Webster, NY | 2 | PTBLXML, file of 2026-10-20 |
CPC categories
| Subclass | Category | First group | Source |
|---|---|---|---|
| G01B | Measuring length, thickness or similar linear dimensions; measuring angles; measuring areas; measuring irregularities of surfaces or contours | G01B11/303 | PTBLXML, file of 2026-10-20 |
| G03F | Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor; | G03F7/70508 | PTBLXML, file of 2026-10-20 |
| G05B | Control or regulating systems in general; functional elements of such systems; monitoring or testing arrangements for such systems or elements | G05B2219/37402 | PTBLXML, file of 2026-10-20 |
| H10P | Generic processes or apparatus for the manufacture or treatment of devices covered by class h10 | H10P74/203 | PTBLXML, file of 2026-10-20 |
Cooperative Patent Classification, as currently assigned (one row per subclass).
Assignments and security interests
No recorded assignments or security interests on file for this patent.
USPTO bulk data: PatentsView granted patents, disambiguated (PVGPATDIS) for patents, assignees, inventors, places and CPC categories; the USPTO Patent Assignment Dataset (ECORSEXC) for assignments and security interests. Patents filed in the last 20 years. No claims or full text. Links to other records are by name (and state): EXACT means the identical full name and state; FUZZY means a looser name match, with the confidence shown.