Patents
US 12760417 B2: Atomic layer deposition methods for making omnidirectional structural color multilayer structures
- Granted
- 2026-10-13
- Filed
- 2023-07-07 application 18219368
- Type
- Utility · 21 claims
- Elsewhere
- Google Patents ↗ · USPTO patent document ↗ · USPTO Patent Center record ↗
Abstract
A method of forming a multilayer structure that reflects an omnidirectional structural color by atomic layer deposition (ALD) includes introducing at least one reflective core particle into a reaction chamber and depositing a conformal dielectric layer encapsulating the at least one reflective core particle in a dielectric-layer ALD cycle. Subsequently, a conformal barrier layer encapsulating the conformal dielectric layer is deposited in a barrier-layer ALD cycle, and a conformal absorber layer encapsulating the conformal barrier layer is deposited in an absorber-layer ALD cycle.
Source: PTBLXML, file of 2026-10-13 (ipgb20261013.xml).
Assignees
| Assignee | Type | Place | Also on furp.org | Source |
|---|---|---|---|---|
| Toyota Motor Engineering & Manufacturing North America, Inc. 4,290 patents | US company or organization | Plano, TX | Toyota Motor Engineering & Manufacturing North America, Inc. State business registration EXACT high confidence: identical full name and state | PTBLXML, file of 2026-10-13 |
| Toyota Jidosha Kabushiki Kaisha 30,553 patents | Foreign company or organization | Toyota, JP | PTBLXML, file of 2026-10-13 |
Inventors
| Inventor | Place | Patents | Person page | Source |
|---|---|---|---|---|
| Songtao Wu | Ann Arbor, MI | 73 | PTBLXML, file of 2026-10-13 | |
| Debasish Banerjee | Ann Arbor, MI | 129 | PTBLXML, file of 2026-10-13 | |
| Minjuan Zhang | Ann Arbor, MI | 75 | PTBLXML, file of 2026-10-13 |
CPC categories
| Subclass | Category | First group | Source |
|---|---|---|---|
| C23C | Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general | C23C16/45555 | PTBLXML, file of 2026-10-13 |
| G02B | Optical elements, systems or apparatus | G02B5/085 | PTBLXML, file of 2026-10-13 |
Cooperative Patent Classification, as currently assigned (one row per subclass).
Assignments and security interests
No recorded assignments or security interests on file for this patent.
USPTO bulk data: PatentsView granted patents, disambiguated (PVGPATDIS) for patents, assignees, inventors, places and CPC categories; the USPTO Patent Assignment Dataset (ECORSEXC) for assignments and security interests. Patents filed in the last 20 years. No claims or full text. Links to other records are by name (and state): EXACT means the identical full name and state; FUZZY means a looser name match, with the confidence shown.