Patents
US 12709626 B2: Precursors for selective deposition of silicon-containing films
- Granted
- 2026-08-18
- Filed
- 2024-08-20 application 18809639
- Type
- Utility · 20 claims
- Elsewhere
- Google Patents ↗ · USPTO patent document ↗ · USPTO Patent Center record ↗
Abstract
Precursors for selective deposition of silicon-containing films are provided. A precursor comprises a compound of the formula: R(HO)Si(OR1)(OR2), where: R is or comprises an alkyl, an alkenyl, or an alkoxy; and R1 and R2 are independently a hydrogen, an alkoxyl, or R1 and R2 are bonded to form a heterocycle. Devices comprising silicon-containing films are also provided, wherein the silicon-containing film comprises a reaction product of the precursor and another reactive species. Methods of depositing silicon-containing films are also provided, among other things.
Source: PTBLXML, file of 2026-08-18 (ipgb20260818.xml).
Assignees
| Assignee | Type | Place | Also on furp.org | Source |
|---|---|---|---|---|
| Entegris, Inc. 666 patents | US company or organization | Billerica, MA | ENTEGRIS, INC. Federal lobbying client EXACT high confidence: identical full name and state ENTEGRIS INC SEC filer EXACT medium confidence: identical full name, one of each nationally | PTBLXML, file of 2026-08-18 |
Inventors
| Inventor | Place | Patents | Person page | Source |
|---|---|---|---|---|
| Drew Michael Hood | Newtown, CT | PTBLXML, file of 2026-08-18 | ||
| Thomas M. Cameron | Newtown, CT | 24 | PTBLXML, file of 2026-08-18 | |
| Bryan C. Hendrix | Danbury, CT | 68 | PTBLXML, file of 2026-08-18 |
CPC categories
| Subclass | Category | First group | Source |
|---|---|---|---|
| C07F | Acyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium | C07F7/025 | PTBLXML, file of 2026-08-18 |
| C23C | Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general | C23C16/402 | PTBLXML, file of 2026-08-18 |
Cooperative Patent Classification, as currently assigned (one row per subclass).
Assignments and security interests
No recorded assignments or security interests on file for this patent.
USPTO bulk data: PatentsView granted patents, disambiguated (PVGPATDIS) for patents, assignees, inventors, places and CPC categories; the USPTO Patent Assignment Dataset (ECORSEXC) for assignments and security interests. Patents filed in the last 20 years. No claims or full text. Links to other records are by name (and state): EXACT means the identical full name and state; FUZZY means a looser name match, with the confidence shown.