Patents
US 12652976 B2: Systems and methods for silicon microstructures fabricated via greyscale DRIE with SOI release
- Granted
- 2026-06-09
- Filed
- 2022-07-07 application 17860049
- Type
- Utility · 19 claims
- Elsewhere
- Google Patents ↗ · USPTO patent document ↗ · USPTO Patent Center record ↗
Abstract
The present disclosure relates to a method for at least one of forming a part or modifying a part, and a system therefor. The method involves initially providing a planar structure having a first material layer disposed on a second material layer. A lithographic operation including greyscale printing is performed to produce a resist material layer on the first material layer, with the resist material layer having a predetermined three-dimensional pattern extending along X, Y and Z axes, with features helping to define the three-dimensional pattern having differing dimensions along the Z axis, and which acts as a mask. An etch process is then performed, using the mask provided by the resist material layer, to etch the first material layer to impart the pattern of the mask as an etched pattern into the first material layer in accordance with a predetermined selectivity etching ratio, such that the etched pattern in the first material layer includes features formed with greater dimensions than corresponding features in the mask of the resist material layer.
Source: PTBLXML, file of 2026-06-09 (ipgb20260609.xml).
Assignees
| Assignee | Type | Place | Also on furp.org | Source |
|---|---|---|---|---|
| Lawrence Livermore National Security, LLC 1,498 patents | US company or organization | Livermore, CA | LAWRENCE LIVERMORE NATIONAL SECURITY, LLC State business registration EXACT high confidence: identical full name and state | PTBLXML, file of 2026-06-09 |
Inventors
| Inventor | Place | Patents | Person page | Source |
|---|---|---|---|---|
| Jeremy Robert Gleick | Pleasanton, CA | PTBLXML, file of 2026-06-09 | ||
| Razi-Ul Muhammad Haque | San Francisco, CA | 11 | PTBLXML, file of 2026-06-09 |
CPC categories
| Subclass | Category | First group | Source |
|---|---|---|---|
| H10P | Generic processes or apparatus for the manufacture or treatment of devices covered by class h10 | H10P50/242 | PTBLXML, file of 2026-06-09 |
| G03F | Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor; | G03F7/16 | PTBLXML, file of 2026-06-09 |
Cooperative Patent Classification, as currently assigned (one row per subclass).
Assignments and security interests
| Recorded | What | From | To | Reel/frame | Source |
|---|---|---|---|---|---|
| 2022-10-06 | Assignment Assignment of assignor's interest | GLEICK, JEREMY ROBERT signed 2021-09-15 HAQUE, RAZI-UL MUHAMMAD signed 2021-10-05 | LAWRENCE LIVERMORE NATIONAL SECURITY, LLC LIVERMORE, CA | 61330/138 | PASDL, file of 2026-10-15 |
| 2022-07-29 | Government interest Confirmatory license (see document for details) | LAWRENCE LIVERMORE NATIONAL SECURITY, LLC signed 2022-07-28 | U.S. DEPARTMENT OF ENERGY WASHINGTON, DC | 61004/590 | PASDL, file of 2026-10-15 |
Documents recorded with the USPTO Assignment Recordation Branch that list this patent. A security interest is a lender’s claim on the patent as collateral; a release ends it.
USPTO bulk data: PatentsView granted patents, disambiguated (PVGPATDIS) for patents, assignees, inventors, places and CPC categories; the USPTO Patent Assignment Dataset (ECORSEXC) for assignments and security interests. Patents filed in the last 20 years. No claims or full text. Links to other records are by name (and state): EXACT means the identical full name and state; FUZZY means a looser name match, with the confidence shown.