Patents

US 11674221 B2: Erosion / corrosion resistant barrier coating

Granted
2023-06-13
Filed
2017-12-22 application 15852399
Type
Utility · 27 claims
Elsewhere
Google Patents ↗ · USPTO patent document ↗ · USPTO Patent Center record ↗

Abstract

Disclosed are barrier coatings for fused silica components used in semiconductor processing. In particular, the present disclosure concerns protective substrate-barrier coatings composed of corrosion-resilient metal compounds which provide superior resistance to erosion/corrosion when a coated substrate is subjected to the acidic environments at elevated temperatures typical for semiconductor processing.

Source: PVGPATDIS, file of 2026-04-10 (ipg230613.xml).

Assignees

AssigneeTypePlaceAlso on furp.orgSource
CONAX TECHNOLOGIES 2 patentsUS company or organizationBuffalo, NYCONAX TECHNOLOGIES LLC State business registration FUZZY medium confidence: same name (legal endings aside) and statePVGPATDIS, file of 2026-04-10
Alfred University 3 patentsUS company or organizationAlfred, NYAlfred University College or university EXACT high confidence: identical full name and state
ALFRED UNIVERSITY Federal lobbying client EXACT high confidence: identical full name and state
ALFRED UNIVERSITY Nonprofit EXACT high confidence: identical full name and state
PVGPATDIS, file of 2026-04-10

Inventors

InventorPlacePatentsPerson pageSource
Matthew M. HallMendon, NY1PVGPATDIS, file of 2026-04-10
Timothy J. KeenanWellsville, NY5PVGPATDIS, file of 2026-04-10
Lana Margaret PlacekNiagara Falls, NY1PVGPATDIS, file of 2026-04-10
Scott Michael KroonOrchard Park, NY1PVGPATDIS, file of 2026-04-10
William Sean HalliganBoston, NY1PVGPATDIS, file of 2026-04-10
Michael Edward FerraroLockport, NY1PVGPATDIS, file of 2026-04-10

CPC categories

SubclassCategoryFirst groupSource
C23CCoating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in generalC23C16/4404PVGPATDIS, file of 2026-04-10
C03CChemical composition of glasses, glazes or vitreous enamels; surface treatment of glass; surface treatment of fibres or filaments made from glass, minerals or slags; joining glass to glass or other materialsC03C17/22PVGPATDIS, file of 2026-04-10
C23DEnamelling of, or applying a vitreous layer to, metalsC23D5/02PVGPATDIS, file of 2026-04-10

Cooperative Patent Classification, as currently assigned (one row per subclass).

Assignments and security interests

RecordedWhatFromToReel/frameSource
2018-02-12Assignment
Assignment of assignor's interest
HALL, MATTHEW M. signed 2018-01-10
KEENAN, TIMOTHY signed 2018-01-16
ALFRED UNIVERSITY ALFRED, NY44899/29ECORSEXC, file of 2026-09-25
2018-02-12Assignment
Assignment of assignor's interest
FERRARO, MICHAEL EDWARD signed 2018-01-02
HALLIGAN, WILLIAM SEAN signed 2018-01-02
KROON, SCOTT MICHAEL signed 2018-01-02
PLACEK, LANA MARGARET signed 2018-01-02
CONAX TECHNOLOGIES BUFFALO, NY44898/888ECORSEXC, file of 2026-09-25

Documents recorded with the USPTO Assignment Recordation Branch that list this patent. A security interest is a lender’s claim on the patent as collateral; a release ends it.

USPTO bulk data: PatentsView granted patents, disambiguated (PVGPATDIS) for patents, assignees, inventors, places and CPC categories; the USPTO Patent Assignment Dataset (ECORSEXC) for assignments and security interests. Patents filed in the last 20 years. No claims or full text. Links to other records are by name (and state): EXACT means the identical full name and state; FUZZY means a looser name match, with the confidence shown.